| Most of applied metallic materials are polycristalline
with grain sizes in the order of several micrometers. It is now
possible to process metallic materials with grain sizes below 1
micron (ultra-fine grain – UFG) or 100 nm (nanocrystals).
At this scale, new physical properties surface: from a mechanical
perspective, metallic nanocrystals exhibit a yield stress that is
up to 10 times higher than their micrometer-grained counterparts.
This is the reason why these materials focus a great deal of interest,
both from the fundamental and applied point of view. This increased
strength finds its roots in the confinement of dislocations that
usually carry out the plastic deformation of crystals in a wide
range of stress and temperature.
A significant research enterprise has been undertaken to identify
the specific mechanisms responsible for this confined plasticity.
These mechanisms are mostly unknown, especially because current
analysis methods fails to overcome the problems linked to the very
small size of the grains. Another obstacle is the supposed variety
of such mechanisms : individual atomic movements, intergranular
diffusion, partial dislocation emission,…
For a few years, in situ Transmission Electron Microscopy
(TEM) has proved to be a key tool to simultaneously trigger
and analyse in real time the fine plastic mechanisms at work in
a material. CEMES has been recognized for long as a world leader
for in-situ TEM. We currently work on several low to high temperature
straining experiments. Through the "Nanolab " activity
of the ESTEEM
European project, we are also designing new TEM holders for
in-situ straining experiments (tensile loading, bending, nano-indenting,..). |
TEM dark field micrographs taken in nc-Al deformed
in-situ. Note the fast motion of the lower part of the grain. The
dashed line indicates the position of the GB in a). |

TEM bright field micrograph showing a cross section
of a polycrystalline 200nm thick epilayer of aluminium on silicium.
Note the presence of a only one dislocation in the grain in the center
of the picture. |
Our research activities focus on various micro or
nano-structured materials :
- Pure nanocrystalline metals (Al, Cu) obtained by electrodeposition
– free-standing films that can be strained in dedicated microtesting
machines (JHU) (http://pegasus.me.jhu.edu/~sharpe/index.html).
- Bulk ultra fine grain materials
- Thin films on substrate
- Metallic glasses
We are focusing in understanding :
- Plastic relaxation mechanisms related to grain boundary motion
unders stress for nanocristals and UFG materials
- Dislocation mechanisms in UFG materials (Bauschinger effects,
dislocation/grain boundary interaction,…)
- Hardening in thin films
- Size effect in metallic glasses
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To
learn more
References:
Legros, M., B. R. Elliott, M. N. Rittner, J. R. Weertman and K.
J. Hemker (2000). "Microsample tensile testing of nanocrystalline
metals." Philosophical Magazine A (Physics of Condensed Matter:
Structure, Defects and Mechanical Properties) 80(4): 1017-1026.
Mompiou F, Legros, M., Caillard, D., “Stress Assisted Grain
Growth Revealed By In Situ TEM”, MRS proceedings, 1086-U09-04,
2008
Dehm G, Legros M, Heiland B. in-situ TEM straining experiments
of Al films on polyimide using a novel FIB design for specimen preparation.
Journal of Materials Science 2006;41:4484.
Dehm G, Oh SH, Gruber P, Legros M, Fischer FD. Strain compensation
by twinning in Au thin films: Experiment and model. Acta Materialia
2007;55:6659.
Legros M. Relaxation plastique des couches minces métalliques
par dislocations et défauts étendus. In: Mouis M,
editor. Contraintes en microelectronique. Hermes, 2006.
Legros M, Dehm G, Balk TJ. In-Situ TEM Study of Plastic Stress
Relaxation Mechanisms and Interface Effects in Metallic Films. In:
Buchheit TE, Minor AM, Spolenak R, Takashima K, editors. Materials
Research Society, vol. 875, Thin Films: Stress and mechanical properties
XI. San Francisco: Materials Research Society, 2005. p.237.
Legros M, Hemker KJ, Gouldstone A, Suresh S, Keller-Flaig RM,
Arzt E. Microstructural evolution in passivated Al films on Si substrates
during thermal cycling. Acta Materialia 2002;50:3435.
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Collaborations:
K. Hemker, J. Hopkins Univ., H. Mughrabi, University of
Erlangen, T. Pardoen, UCL Louvain, S. Gravier (SIMAP Grenoble)
Project:
ESTEEM project Nanolab
ANR MEGAPROSE
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