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REALISE European project (NMP4-CT-2006-016172)

http://www.tyndall.ie/realise/


The project ‘Rare earth oxide atomic layer deposition for innovation in electronics’ aims:

(1) to develop an atomically controlled deposition process for rare earth oxide layers as an enabling technology for a variety of innovative integrated circuit technologies and

(2) to advance fundamental knowledge of materials functionality in the areas of thin film growth, oxide-semiconductor interfaces, surface-precursor reactions and atomic-scale characterisation of dielectrics.

No satisfactory process exists for depositing rare earth oxide films as high-k dielectrics at present. The process that is the subject of this project is atomic layer deposition (ALD), the leading technology for deposition of nanometre-scale films. The project aims to overcome the current difficulties and limitations of rare earth oxide ALD, through project goals that span the entire process: design, synthesis and testing of suitable precursors; scale-up of precursor synthesis; characterisation of film quality; optimisation of deposition parameters.
To investigate the functionality of rare earth oxides as dielectrics and to show the utility of ALD as an enabling technology for the electronics industry, further goals of REALISE are: deposition onto variously-prepared semiconductor substrates (Si, Ge); high-resolution characterisation of the oxide-semiconductor interface; scale-up of new ALD process to industrially-sized Si wafers; testing of dielectric in capacitors for innovative memory and wireless applications.
REALISE mobilises European expertise in fine chemicals, thin film growth and interface analysis, and translates this into materials integration solutions for the European semiconductor industry.

The REALISE consortium consists of 10 partners, 5 academic and 5 industrial.

Consortium:
• Tyndall National Institute (Cork, Ireland, Project coordinator), CNR-INFM MDM (Milan, Italie) and CEMES-CNRS (Toulouse, France) are research institutes;

• UHel (Helsinki, Finland) and UnivLiv (Liverpool, U.K) are University departments;

• Epichem-SAFC Hitech (Liverpool, U.K) is in high-tech chemical manufacturing;

• ASM Microchemistry is a research subsidiary of tool manufacturer ASM International (Helsinki, Finland);

• ST M6-Numonyx (Milan, Italie), Infineon-Qimonda (Dresden, Allemagne), Philips-NXP (Eindhoven, Netherlands) are research divisions of major semiconductor companies.

Team at CEMES:
S. Schamm, P.E. Coulon

 
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